Company Filing History:
Years Active: 1994-2003
Title: Innovations of Joshua Chiu-Wing Tsui
Introduction
Joshua Chiu-Wing Tsui is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma technology, holding a total of 11 patents. His work primarily focuses on advancements in plasma reactors, which are essential for various semiconductor processing applications.
Latest Patents
One of his latest patents is titled "Plasma reactor having an inductive antenna coupling power through a parallel plate electrode." This invention describes a plasma reactor designed for processing workpieces, featuring a reactor enclosure that defines a processing chamber. It includes a base for supporting the workpiece, a semiconductor window electrode, and a gas inlet system for introducing plasma precursor gas. An inductive antenna is strategically placed to couple power into the chamber through the semiconductor window electrode.
Another notable patent is "Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density." This invention presents a plasma reactor for processing semiconductor workpieces, such as wafers. It features a chamber with a three-dimensional overhead ceiling and an inductive antenna that can be conformal or nonconformal in shape. The design allows for the adjustment of plasma ion density across the wafer surface, ensuring optimal processing uniformity.
Career Highlights
Joshua Tsui is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in the development of innovative plasma technologies.
Collaborations
Throughout his career, Joshua has collaborated with notable colleagues, including Kenneth S. Collins and John R. Trow. These collaborations have further enhanced his contributions to the field of plasma technology.
Conclusion
Joshua Chiu-Wing Tsui's innovative work in plasma reactors has significantly impacted semiconductor processing. His numerous patents reflect his dedication to advancing technology in this critical area.
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