The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 1994
Filed:
Dec. 02, 1992
Kenneth S Collins, San Jose, CA (US);
John R Trow, San Jose, CA (US);
Joshua C Tsui, Santa Clara, CA (US);
Craig A Roderick, San Jose, CA (US);
Nicolas J Bright, Saratoga, CA (US);
Jeffrey Marks, San Jose, CA (US);
Tetsuya Ishikawa, Funabashi, JP;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An electrostatic chuck for holding an article to be processed in a plasma reaction chamber and comprising a metal pedestal coated with a layer of dielectric material in which is formed a cooling gas distribution system for passing and distributing a cooling gas between the upper surface of the layer and the article when supported on the pedestal. The gas distribution system comprises a plurality of intersecting grooves formed entirely in the upper surface of the layer with small gas distribution holes through intersections of the grooves over upper ends of cooling gas receiving holes formed in an underside of the pedestal.