The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2003
Filed:
Mar. 13, 2000
Kenneth S. Collins, San Jose, CA (US);
Michael Rice, Pleasanton, CA (US);
John Trow, San Jose, CA (US);
Douglas Buchberger, Tracy, CA (US);
Eric Askarinam, Sunnyvale, CA (US);
Joshua Chiu-Wing Tsui, Santa Clara, CA (US);
David W. Groechel, Los Altos Hills, CA (US);
Raymond Hung, San Jose, CA (US);
Applied Materials, Inc, Santa Clara, CA (US);
Abstract
A plasma reactor for processing a workpiece includes a reactor enclosure defining a processing chamber, a base within the chamber for supporting the workpiece during processing thereof, a semiconductor window electrode overlying the base, a gas inlet system for admitting a plasma precursor gas into the chamber, an electrical terminal coupled to the semiconductor window electrode, an inductive antenna adjacent one side of the semiconductor window electrode opposite the base for coupling power into the interior of said chamber through the semiconductor window electrode.