Company Filing History:
Years Active: 1998-2003
Title: The Innovative Contributions of Eric Askarinam
Introduction
Eric Askarinam is a prominent inventor based in Sunnyvale, California. He has made significant contributions to the field of plasma technology, holding a total of 10 patents. His work focuses on advancements in plasma reactors, which are essential for various semiconductor processing applications.
Latest Patents
Among his latest patents is a "Plasma reactor having an inductive antenna coupling power through a parallel plate electrode." This invention describes a plasma reactor designed for processing workpieces, featuring a reactor enclosure that defines a processing chamber. It includes a base for supporting the workpiece, a semiconductor window electrode, and a gas inlet system for introducing plasma precursor gas. An inductive antenna is strategically placed to couple power into the chamber through the semiconductor window electrode.
Another notable patent is the "Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density." This invention outlines a plasma reactor that processes semiconductor workpieces, such as wafers. It features a chamber with a three-dimensional overhead ceiling and an inductive antenna that can be conformal or nonconformal in shape. The design allows for the adjustment of plasma ion density across the wafer surface, ensuring uniform processing.
Career Highlights
Eric Askarinam has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. His experience in these organizations has contributed to his expertise in plasma technology and reactor design.
Collaborations
Throughout his career, Eric has collaborated with notable professionals in the field, including Michael Robert Rice and Kenneth S. Collins. These collaborations have further enhanced his innovative capabilities and contributions to plasma technology.
Conclusion
Eric Askarinam's work in plasma reactor technology showcases his commitment to innovation and excellence in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in plasma processing, making him a valuable contributor to the field.
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