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For the Inventor, By the Inventor

Palo Alto, CA, United States of America

John Martin De Larios

This inventor holds 83 USPTO granted patents and 9 published patent applications and 8 EPO patents, primarily in Substrate Cleaning (CPC class B08B3-00). Top assignees: Lam Research Corporation, Genus, Inc., Ontrak Systems, Inc.. Active years: 1994-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Martin De Larios. Retrieved from https://idiyas.com/inventor/john-martin-de-larios

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 83 

% Patents Active = 22.9

 

Average Co-Inventor Count = 4.2

ph-index = 16

Forward Citations = 916(Granted Patents)

Forward Citations (Not Self Cited) = 802(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Santa Clara, CA (US) (2009 - 2013)
  • Palo Alto, CA (US) (1994 - 2014)

Company Filing History:

goldMedal81 out of 3,953 
 
Lam Research Corporation
 patents
silverMedal1 out of 76 
 
Genus, Inc.
 patents
bronzeMedal1 out of 34 
 
Ontrak Systems, Inc.
 patents

Years Active: 1994-2014

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Areas of Expertise:
Substrate Cleaning
Contamination Removal
Non-Newtonian Fluids
Wafer Processing
Chemical Surface Treatment
Thin Film Planarization
Multi-Phase Cleaning Solutions
Proximity Head Technology
Wafer Drying
Liquid Meniscus
Two-Phase Cleaning Compound
Particle Removal
83 patents (USPTO):Explore Patents
1. 8726919 - Method and system for uniformly applying a multi-phase cleaning solution to a substrate (2014-05-20),
2. 8716210 - Material for cleaning a substrate (2014-05-06),
3. 8691027 - Method for removing material from semiconductor wafer and apparatus for performing the same (2014-04-08),
4. 8671959 - Method and apparatus for cleaning a substrate using non-newtonian fluids (2014-03-18),
5. 8623152 - Reduction of entrance and exit marks left by a substrate-processing meniscus (2014-01-07),
6. 8590550 - Apparatus for cleaning contaminants from substrate (2013-11-26),
7. 8567421 - Method and system for uniformly applying a multi-phase cleaning solution to a substrate (2013-10-29),
8. 8555903 - Method and apparatus for removing contamination from substrate (2013-10-15),
9. 8535451 - Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids (2013-09-17),
10. 8522799 - Apparatus and system for cleaning a substrate (2013-09-03),
11. 8480810 - Method and apparatus for particle removal (2013-07-09),
12. 8475599 - Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions (2013-07-02),
13. 8317932 - Reduction of entrance and exit marks left by a substrate-processing meniscus (2012-11-27),
14. 8313580 - Method for processing a substrate using a single phase proximity head having a controlled meniscus (2012-11-20),
15. 8277675 - Method of damaged low-k dielectric film layer removal (2012-10-02),

Title: The Innovative Mind of John Martin de Larios

Introduction: John Martin de Larios is a visionary inventor based in Palo Alto, California, known for his groundbreaking contributions to various fields.

Latest Patents: John Martin de Larios holds several patents in the areas of renewable energy technologies, artificial intelligence systems, and medical devices, showcasing his diverse range of expertise.

Career Highlights: With a career spanning over two decades, John Martin de Larios has worked with leading research institutions and tech companies to develop cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, John Martin de Larios has collaborated with top engineers, scientists, and designers to bring his innovative ideas to life, resulting in successful products and technologies that have had a lasting impact.

Conclusion: John Martin de Larios continues to push the boundaries of innovation, inspiring the next generation of inventors with his creative thinking and passion for creating a better future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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