John M Baker

Title: Innovations of John M Baker

Introduction

John M Baker is a notable inventor based in Yorktown Heights, NY (US). He has made significant contributions to the field of chemical vapor deposition processes, holding a total of 3 patents. His work primarily focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "In-situ monitoring of chemical vapor deposition process by mass spectrometry." This invention provides a method and apparatus for controlling a CVD process used to deposit films on semiconductor substrates. The by-products of the reaction are measured and monitored during the reaction, preferably using mass spectrometry. The results are utilized to calculate the concentrations of the by-products and to control the CVD reaction process based on these concentrations. An exemplary application of this process is the deposition of tungsten metal on a semiconductor wafer. The preferred method employs a capillary gas sampling device to remove the by-product gases as a feed for the mass spectrometer, which is connected to a differential pump.

Another significant patent is the "Method for conditioning process chambers." This invention describes a method for conditioning the inside walls of a process chamber using selected process gases such as Br, HBr, Cl, HCl, F, SiF, and NF. It incorporates a pressure controller and a timer for soaking the chamber, effectively overcoming the need to run dummy product wafers for conditioning.

Career Highlights

John M Baker is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in semiconductor technology. His expertise in chemical processes has made him a valuable asset to the company.

Collaborations

Throughout his career, John has collaborated with notable colleagues, including Doreen D DiMilia and Roger W Cheek. These collaborations have further enriched his work and contributed to the development of innovative solutions in the field.

Conclusion

John M Baker's contributions to the field of chemical vapor deposition and semiconductor manufacturing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this critical area.