The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
May. 10, 2000
Applicant:
Inventors:
John M. Baker, Yorktown Heights, NY (US);
Marc Waine Cantell, Sheldon, VT (US);
Paul Wiliam Pastel, Essex, VT (US);
Alejandro Gabriel Schrott, New York, NY (US);
Ying Zhang, Yorktown Heights, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
A method for conditioning the inside walls of a process chamber is described incorporating a selected process gas such as Br, Br , HBr, Cl , HCl, F , SiF , and NF , a pressure controller, and a timer for soaking the chamber. The invention overcomes the problem of running dummy product wafers to condition the chamber.
Baker, John. (2002). Method for conditioning process chambers (U.S. Patent No. 6420274). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6420274
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile