The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Jan. 16, 2001
Douglas S. Armbrust, Gloucester, MA (US);
John M. Baker, Yorktown Heights, NY (US);
Arne W. Ballantine, Round Lake, NY (US);
Roger W. Cheek, Essex Junction, VT (US);
Doreen D. Dimilia, Pleasantville, NY (US);
Mark L. Reath, St. Albans, VT (US);
Michael B. Rice, Colchester, VT (US);
Douglas S. Armbrust, Gloucester, MA (US);
John M. Baker, Yorktown Heights, NY (US);
Arne W. Ballantine, Round Lake, NY (US);
Roger W. Cheek, Essex Junction, VT (US);
Doreen D. DiMilia, Pleasantville, NY (US);
Mark L. Reath, St. Albans, VT (US);
Michael B. Rice, Colchester, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and apparatus are provided for controlling a CVD process used to deposit films on semiconductor substrates wherein the by-products of the reaction are measured and monitored during the reaction preferably using mass spectrometry and the results used to calculate the concentrations of the by-products and to control the CVD reaction process based on the by-product concentrations. An exemplary CVD process is the deposition of tungsten metal on a semiconductor wafer. A preferred method and apparatus uses a capillary gas sampling device for removing the by-product gases of the reaction as a feed for the mass spectrometer. The capillary gas sampling device is preferably connected to a differential pump.