Location History:
- Sherman, CT (US) (1980 - 1985)
- South Kent, CT (US) (1983 - 1993)
Company Filing History:
Years Active: 1980-1993
Title: Innovations of John L Mauer, Iv
Introduction
John L Mauer, Iv is a notable inventor based in South Kent, CT (US). He has made significant contributions to the field of technology, particularly in the area of semiconductor devices and lithography. With a total of 11 patents to his name, Mauer has demonstrated a commitment to advancing innovation in his field.
Latest Patents
One of Mauer's latest patents is titled "Resist development endpoint detection for X-ray lithography." This invention provides a method for determining the development endpoint in an X-ray lithographic process. The endpoint is determined by visually observing resist test field patterns through a microscope during the developing step. As the developing process occurs, changing test field patterns are formed due to different radiation doses being applied simultaneously. When the changing test field pattern matches a known pattern correlated to the desired development endpoint, the workpiece is removed from the developing step.
Another significant patent is the "Schottky diode having limited area self-aligned guard ring and method." This invention discloses a method for fabricating a small area, self-aligned guard ring in a Schottky barrier diode. The process involves anisotropically etching a vertically-walled hole through a dielectric layer on a silicon substrate. A layer of doped polycrystalline silicon is then deposited over the apertured dielectric layer. The structure is heated to diffuse the dopant from the lining into the substrate, followed by the deposition of Schottky diode metal on the exposed substrate.
Career Highlights
Mauer's career has been marked by his work at International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His expertise in semiconductor technology has positioned him as a key player in the development of advanced electronic components.
Collaborations
Throughout his career, Mauer has collaborated with notable colleagues, including Richard C Joy and Bernard M Kemlage. These collaborations have further enhanced his contributions to the field and have fostered a spirit of innovation within his team.
Conclusion
John L Mauer, Iv is a distinguished inventor whose work has significantly impacted the technology sector. His patents reflect a deep understanding of complex processes and a dedication to innovation. Mauer's contributions continue to influence advancements in semiconductor technology and lithography.
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