The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1980
Filed:
Sep. 10, 1979
Applicant:
Inventors:
Reginald F Lever, Putnam Valley, NY (US);
John L Mauer, IV, Sherman, CT (US);
Alwin E Michel, Ossining, NY (US);
Laura B Rothman, Sherman, CT (US);
Assignee:
International Business Machines Corporation, , NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
148-15 ; 2957 / ; 29578 ; 29580 ; 10628713 ; 148175 ; 156643 ; 156657 ; 156662 ; 357 49 ; 357 50 ; 357 54 ; 427 93 ; 427 95 ; 427 431 ;
Abstract
A planar deep oxide isolation process for providing deep wide silicon dioxide filled trenches in the planar surface of a silicon semiconductor substrate, said process comprising the steps: