The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 1985
Filed:
Jul. 01, 1983
John L Mauer, IV, Sherman, CT (US);
Michel S Michail, Wappingers Falls, NY (US);
Ollie C Woodard, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An electron beam method and apparatus, for writing patterns, such as on semiconductor wafers, in which the writing field is divided into a large number of overlapping subfields with a predetermined periodicity. Subfield to subfield moves are made in a stepped sequential scan, such as raster, while patterns, within a subfield, are addressed using vector scan and written using a sequential scan. Significant improvement in throughput results by the use of this electron beam method and apparatus which preferably employs magnetic deflection for the sequential scanning the subfields and electric deflection for vector scanning within the subfield.