The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 1983
Filed:
Aug. 18, 1980
Applicant:
Inventors:
Joseph S Logan, Poughkeepsie, NY (US);
John L Mauer, IV, Sherman, CT (US);
Laura B Rothman, Sherman, CT (US);
Geraldine C Schwartz, Poughkeepsie, NY (US);
Charles L Standley, Wappingers Falls, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 29580 ; 156644 ; 156646 ; 156653 ; 156655 ; 1566611 ; 156668 ; 2041 / ; 357 67 ; 357 71 ; 427 89 ; 427 90 ; 430313 ; 430317 ;
Abstract
Use of a dual composite mask for a lift-off multi-layered structure process in which a base component layer acts as an etch stop for reactive ion etching of overlying layers.