This inventor holds 3 USPTO granted patents and 2 EPO patents. Top assignee: Kla Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: John J Biafore: Innovator in EUV Lithography
Introduction
John J Biafore is an inventor based in North Scituate, Rhode Island, USA. He is associated with Kla Tencor Corporation, where he contributes to advancements in lithography technology. Although he currently holds no granted patents, his work in the field is noteworthy.
Latest Patent Applications
One of John J Biafore's significant patent applications is titled "Method to Calibrate, Predict, and Control Stochastic Defects in EUV Lithography." This application focuses on using an initial probability of occurrence of a stochastic defect over an inspection area of a workpiece. The process involves imaging one or more defects within the inspection area using an optical tool or an electron beam tool. A probability of occurrence of a stochastic defect at each of the defect locations is generated using a model. The defect locations are then grouped into probability bins. Furthermore, a consistency between the initial probability and observed results is determined, allowing the model to be tuned based on this consistency.
Conclusion
John J Biafore's contributions to the field of EUV lithography, particularly through his innovative patent application, highlight his role as a significant figure in advancing technology. His work continues to influence the industry, showcasing the importance of research and development in addressing complex challenges.