Williston, VT, United States of America

John C Hall


Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 12(Granted Patents)


Location History:

  • New Hartford, CT (US) (2014)
  • Essex Junction, VT (US) (2018)
  • Williston, VT (US) (2019)
  • Glen Allen, VA (US) (2020)

Company Filing History:


Years Active: 2014-2020

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4 patents (USPTO):

Title: John C Hall: Innovator in Semiconductor Technology

Introduction

John C Hall is a notable inventor based in Williston, VT (US), recognized for his contributions to semiconductor technology. With a total of 4 patents, Hall has made significant advancements in the field, particularly in the area of through-substrate vias and etching processes.

Latest Patents

One of Hall's latest patents is titled "Ring isolated through-substrate vias for high resistivity substrates." This invention involves through-substrate vias (TSVs) that extend through a high resistivity semiconductor substrate, which are laterally spaced and isolated from an active device formed over the substrate by deep trench isolation (DTI) structures. The DTI structures may extend partially or entirely through the substrate and can include an air gap, entirely surrounding the active device and the TSVs. Another significant patent is "Controlling of etch depth in deep via etching processes." This patent relates to semiconductor structures and outlines a method to control the depth of etch in deep via etching. The method includes forming an interface within the substrate between an etch control dopant and the substrate material, etching a via within the substrate, and terminating the etching of the via at the interface upon detection of the interface.

Career Highlights

Throughout his career, John C Hall has worked with prominent companies in the semiconductor industry, including Globalfoundries Inc. and International Business Machines Corporation (IBM). His work has contributed to the advancement of technologies that are crucial for modern electronics.

Collaborations

Hall has collaborated with several professionals in his field, including Damyon L Corbin and Steven M Shank. These collaborations have likely enhanced his innovative capabilities and contributed to the successful development of his patents.

Conclusion

John C Hall's work in semiconductor technology showcases his innovative spirit and dedication to advancing the field. His patents reflect significant contributions that have the potential to impact various applications in electronics.

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