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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10192748 B1

PDFFull Text
Date of Patent:
Jan. 29, 2019

Filed:

Oct. 19, 2016

Controlling of etch depth in deep via etching processes and resultant structures

Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Timothy C. Krywanczyk, Essex Junction, VT (US);

Patrick A. Raymond, Enosburg Falls, VT (US);

John C. Hall, Williston, VT (US);

Damyon L. Corbin, St. Albans, VT (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:

Anthony Canale

Andrew M. Calderon

Roberts Mlotkowski Safran Cole & Calderon P.C.

Primary Examiner:

Binh X Tran

Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/306 (2006.01); H01L 21/265 (2006.01); H01L 21/66 (2006.01); H01L 21/3215 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30604 (2013.01); H01L 21/26533 (2013.01); H01L 21/3215 (2013.01); H01L 21/32137 (2013.01); H01L 21/32155 (2013.01); H01L 22/26 (2013.01);
Abstract

The present disclosure relates to semiconductor structures and, more particularly, to a method to control depth of etch in deep via etching and related structures. The method includes: forming an interface within the substrate between an etch control dopant and material of the substrate; etching a via within substrate; and terminating the etching of the via at the interface upon detection of the interface.

Find Patent Forward Citations

Krywanczyk, Timothy. (2019). Controlling of etch depth in deep via etching processes and resultant structures (U.S. Patent No. 10192748). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10192748

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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