Veldhoven, Netherlands

Johannes Maria Freriks


Average Co-Inventor Count = 4.8

ph-index = 4

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2007-2012

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5 patents (USPTO):Explore Patents

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Title: The Inventive Spirit of Johannes Maria Freriks

Introduction:

Johannes Maria Freriks stands as a testament to the power of innovation and the impact that one individual can have on the world through their inventive spirit. His groundbreaking contributions to the field of inventions continue to inspire future generations of inventors to think outside the box and pursue their creative ideas relentlessly.

Latest Patents:

1. Radiation System with Contamination Barrier: Freriks latest patent showcases a radiation system featuring a contamination barrier designed to allow radiation to pass through while capturing debris from the radiation source. The innovative design includes lamellas with specific materials to enhance performance.

2. Contamination Barrier with Expandable Lamellas: Another remarkable invention by Freriks is a contamination barrier that permits radiation to pass through and captures debris. The barrier comprises a support structure, plate members, and a shield to prevent damage from radiation or debris.

Career Highlights:

Currently employed at ASML Netherlands B.V., Johannes Maria Freriks has proven his expertise and dedication to innovation through his five patented inventions. His work in advancing radiation systems has significantly contributed to the technological landscape.

Collaborations:

Freriks has collaborated closely with esteemed coworkers Levinus Pieter Bakker and Marcel Mathijs Theodore Marie Dierichs. Their combined efforts have led to innovative solutions and advancements in the field of inventions.

Conclusion:

In conclusion, Johannes Maria Freriks' inventive prowess and dedication to pushing the boundaries of technology highlight the immense impact that one individual can have on the world. His patents stand as a testament to his innovative spirit and serve as inspiration for aspiring inventors worldwide.

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