Johann Helneder

Title: Johann Helneder: Innovator in Dielectric Layer Technology

Introduction

Johann Helneder is a notable inventor based in Landsham, Germany. He has made significant contributions to the field of integrated circuits and dielectric materials, holding a total of 9 patents. His work has advanced the technology used in electronic devices, particularly in the production of multifunctional dielectric layers.

Latest Patents

One of Johann Helneder's latest patents is a process for producing a multifunctional dielectric layer on a substrate. This innovation allows for the formation of a dielectric layer on exposed metallic strip conductor systems. An additional metal layer is formed across the surface of these conductors, which is then partially converted into a nonconducting metal oxide, creating the dielectric layer. Another significant patent involves an integrated circuit with a capacitor and its production method. This integrated circuit features a capacitor that includes a base electrode, a covering electrode, and a dielectric material situated between them. The dielectric is produced from an oxide of a material found in the base electrode, which can be created through anodic oxidation.

Career Highlights

Throughout his career, Johann Helneder has worked with prominent companies such as Infineon Technologies AG and Siemens Aktiengesellschaft. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the electronics sector.

Collaborations

Johann has collaborated with notable colleagues, including Markus Schwerd and Thomas Goebel. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Johann Helneder's contributions to the field of dielectric materials and integrated circuits have established him as a key figure in electronics innovation. His patents reflect a commitment to advancing technology and improving electronic device performance.