The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 1995
Filed:
Sep. 30, 1992
Siemens Aktiengesellschaft, Munich, DE;
Abstract
A method and apparatus for measuring sheet resistivity of a layer manufactured under the influence of a plasma, wherein a current is generated using two voltage or current sources in a circuit that is composed of a first current branch, a sheet resistivity, and a second current branch. The current includes the parasitic current I.sub.P injected into the layer by the plasma, this having a first and second part which are symmetrically supplied into the two current branches which respectively have an identical resistance overall. The currents I.sub.A and I.sub.B thus actually flowing in the first and second current branch are respectively directly measured, or measured on the basis of the voltage drop-off at known precision resistors. A measured current I.sub.M which is independent of the plasma influence is calculated therefrom by averaging, and the sheet resistivity is calculated from I.sub.M and by measuring the voltage drop-off at the sheet resistivity.