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For the Inventor, By the Inventor

Milpitas, CA, United States of America

Jingchun Zhang

USPTO Granted Patents = 35 

Average Co-Inventor Count = 3.8

ph-index = 30

Forward Citations = 5,002(Granted Patents)


Location History:

  • San Jose, CA (US) (2014 - 2017)
  • Milpitas, CA (US) (2013 - 2018)
  • Cupertino, CA (US) (2015 - 2023)

Company Filing History:

goldMedal35 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2013-2023

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35 patents (USPTO):
1. 11637002 - Methods and systems to enhance process uniformity (2023-04-25),
2. 11239061 - Methods and systems to enhance process uniformity (2022-02-01),
3. 10892198 - Systems and methods for improved performance in semiconductor processing (2021-01-12),
4. 10062578 - Methods for etch of metal and metal-oxide films (2018-08-28),
5. 10026597 - Hydrogen plasma based cleaning process for etch hardware (2018-07-17),
6. 9887096 - Differential silicon oxide etch (2018-02-06),
7. 9881805 - Silicon selective removal (2018-01-30),
8. 9842744 - Methods for etch of SiN films (2017-12-12),
9. 9754800 - Selective etch for silicon films (2017-09-05),
10. 9576809 - Etch suppression with germanium (2017-02-21),
11. 9564338 - Silicon-selective removal (2017-02-07),
12. 9472412 - Procedure for etch rate consistency (2016-10-18),
13. 9449845 - Selective titanium nitride etching (2016-09-20),
14. 9437451 - Radical-component oxide etch (2016-09-06),
15. 9418858 - Selective etch of silicon by way of metastable hydrogen termination (2016-08-16),

Title: Innovations of Jingchun Zhang in Semiconductor Processing

Introduction: Jingchun Zhang is a prolific inventor based in Milpitas, California, holding an impressive total of 35 patents to his name. He is currently associated with Applied Materials, Inc., a leading company in the field of semiconductor equipment and technology. His work primarily focuses on enhancing process uniformity in semiconductor processing, a critical aspect of modern electronics manufacturing.

Latest Patents: Among his latest innovations is a patent titled "Methods and systems to enhance process uniformity." This patent details a semiconductor processing chamber designed with a remote plasma region and a processing region that is fluidly coupled with the former. The processing region is configured to house a substrate on a support pedestal, which incorporates two distinct materials—one in the interior region and another in an annular member at the exterior region. This ingenious design promises to improve efficiency and consistency in semiconductor fabrication processes.

Career Highlights: Jingchun Zhang's career boasts significant contributions to semiconductor technology. With 35 patents, he has established himself as an authority in the field. His innovative approaches have not only advanced the science of semiconductor processing but also play a crucial role in the ongoing evolution of electronic devices.

Collaborations: Zhang works alongside talented colleagues such as Anchuan Wang and Nitin K Ingle at Applied Materials, Inc. Their collective expertise and teamwork drive the success of innovative projects aimed at revolutionizing the semiconductor industry.

Conclusion: Jingchun Zhang exemplifies the spirit of innovation in semiconductor technology. His contributions, through his numerous patents and collaboration with skilled coworkers, underscore the vital role of inventors in advancing technology. With ongoing research and development efforts, Zhang and his team continue to pave the way for future advancements in the semiconductor processing landscape.

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