The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Apr. 28, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Saravjeet Singh, Santa Clara, CA (US);
Alan Tso, San Jose, CA (US);
Jingchun Zhang, Cupertino, CA (US);
Zihui Li, Santa Clara, CA (US);
Hanshen Zhang, Cupertino, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A semiconductor processing chamber may include a remote plasma region, and a processing region fluidly coupled with the remote plasma region. The processing region may be configured to house a substrate on a support pedestal. The support pedestal may include a first material at an interior region of the pedestal. The support pedestal may also include an annular member coupled with a distal portion of the pedestal or at an exterior region of the pedestal. The annular member may include a second material different from the first material.