Miyagi, Japan

Jin Kudo


Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2022

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6 patents (USPTO):Explore Patents

Title: Innovations by Jin Kudo in Plasma Processing Technology

Introduction

Jin Kudo is a notable inventor based in Miyagi, Japan, recognized for his contributions to plasma processing technology. With a total of 6 patents to his name, Kudo has made significant advancements in methods that enhance the efficiency of plasma processing apparatuses.

Latest Patents

One of Kudo's latest patents is a plasma processing method that includes cleaning the inside of the chamber main body of a plasma processing apparatus. This innovative method aims to reduce the time required for cleaning by effectively removing deposits formed within the chamber. The process involves etching an etching target film of a processing target object placed on a stage at low temperatures, utilizing plasma generated from a processing gas that contains fluorocarbon and/or hydrofluorocarbon gases. After processing, the method includes cleaning the chamber's interior by generating plasma from a cleaning gas while maintaining a high temperature on the electrostatic chuck.

Career Highlights

Kudo has established himself as a key figure in the field of plasma processing, working with Tokyo Electron Limited, a leading company in semiconductor manufacturing equipment. His work has contributed to the development of more efficient and effective plasma processing techniques, which are crucial for the semiconductor industry.

Collaborations

Throughout his career, Kudo has collaborated with talented individuals such as Taku Gohira and Maju Tomura. These collaborations have fostered innovation and have led to the successful development of advanced technologies in plasma processing.

Conclusion

Jin Kudo's work in plasma processing technology exemplifies the impact of innovative thinking in the semiconductor industry. His patents and collaborations continue to influence advancements in this critical field.

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