Jin J Wu

Title: The Innovative Contributions of Jin J Wu

Introduction

Jin J Wu is a prominent inventor based in Ossining, NY (US), known for his significant contributions to the field of semiconductor technology. With a total of 14 patents to his name, he has made remarkable advancements that have influenced the industry.

Latest Patents

Among his latest patents is the "Dual mask process for semiconductor devices." This method involves fabricating a dual gate structure by providing a semiconductor substrate with a first and second device area, covered by a gate oxide layer and a polysilicon layer. The process includes forming a first hard mask over the polysilicon layer, which is resistant to a first etching but susceptible to a second etching. A second hard mask is then formed over the first hard mask and polysilicon layer, allowing for precise patterning and etching to create gate patterns on both device areas.

Another notable patent is the "Self-aligned contact for closely spaced transistors." This innovation allows a pair of transistors sharing a common electrode, such as a bitline in a DRAM array, to have a self-aligned contact. The design simplifies the gate stack, improving the uniformity of line width across the chip, which is a significant advancement over traditional DRAM techniques.

Career Highlights

Jin J Wu has worked with several esteemed companies throughout his career, including International Business Machines Corporation (IBM) and Air Products and Chemicals, Inc. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Throughout his career, Jin J Wu has collaborated with notable colleagues, including William A Cavaliere and Wayne Thomas McDermott. These collaborations have further enriched his work and led to significant advancements in the field.

Conclusion

Jin J Wu's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative methods continue to shape the future of semiconductor devices and enhance their performance.