Fremont, CA, United States of America

Jie Diao

USPTO Granted Patents = 11 

Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 34(Granted Patents)


Location History:

  • San Jose, CA (US) (2008 - 2009)
  • Fremont, CA (US) (2012 - 2023)

Company Filing History:


Years Active: 2008-2023

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11 patents (USPTO):

Title: **Innovator Jie Diao: Pioneering Advancements in CMP Technology**

Introduction

Jie Diao is a prominent inventor based in Fremont, California, with a notable portfolio of 11 patents. His work primarily focuses on the development of technologies that enhance the chemical mechanical planarization (CMP) process, which is crucial in semiconductor manufacturing. Diao's innovations reflect a commitment to improving efficiency and performance in the industry.

Latest Patents

Among his latest inventions, Jie Diao has developed innovative solutions such as a retaining ring for CMP. This retaining ring features an annular body designed to constrain a substrate effectively. Its unique design includes a bottom surface with channels enhancing contact with polishing pads, thereby optimizing the polishing process. Another significant patent is the system and process for in situ byproduct removal and platen cooling during CMP. This invention integrates a cleaning system that prevents substrate damage by efficiently removing debris from the polishing pad, thus improving overall process efficiency and reducing scratches and contamination.

Career Highlights

Throughout his career, Jie Diao has been associated with leading technology companies, including Applied Materials, Inc. His experience in these organizations has significantly contributed to his expertise and innovative output in CMP technologies. His patents reflect his deep understanding of the industry's challenges and requirements, positioning him as a key player in semiconductor manufacturing innovation.

Collaborations

Collaboration has played an essential role in Diao's journey as an inventor. He has worked alongside notable colleagues such as Christopher Heung-Gyun Lee and Erik S Rondum, contributing to the enhancement of CMP technology through shared knowledge and expertise. Together, they have aimed to push the boundaries of what is achievable in semiconductor processing.

Conclusion

Jie Diao exemplifies the spirit of innovation in the field of semiconductor manufacturing. Through his numerous patents and collaborative efforts, he has made significant strides in improving CMP processes, paving the way for advancements in the industry. His work continues to influence the efficiencies and capabilities of semiconductor production, demonstrating the vital role of inventors in technological advancement.

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