The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Aug. 11, 2008
Robert A. Marks, San Jose, CA (US);
Christopher Heung-gyun Lee, San Jose, CA (US);
Garlen C. Leung, San Jose, CA (US);
Gregory E. Menk, Pleasanton, CA (US);
Jie Diao, Fremont, CA (US);
Erik S. Rondum, San Ramon, CA (US);
Robert A. Marks, San Jose, CA (US);
Christopher Heung-Gyun Lee, San Jose, CA (US);
Garlen C. Leung, San Jose, CA (US);
Gregory E. Menk, Pleasanton, CA (US);
Jie Diao, Fremont, CA (US);
Erik S. Rondum, San Ramon, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chemical mechanical apparatus comprises a polishing platen, a roller pad assembly capable of advancing a polishing pad across the platen, a substrate carrier to press a substrate against the polishing pad, and a heater to heat the substrate to a temperature sufficiently high to provide a rate of removal of material from the substrate that compensates for the wear of the polishing pad.