San Jose, CA, United States of America

Robert A Marks

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Robert A Marks. Retrieved from https://idiyas.com/inventor/robert-a-marks

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovations of Robert A Marks

Introduction

Robert A Marks is a notable inventor based in San Jose, CA. He has made significant contributions to the field of chemical mechanical polishing. His innovative approach has led to the development of a unique patent that enhances the efficiency of substrate processing.

Latest Patents

Robert A Marks holds a patent for a "Chemical mechanical polisher with heater and method." This invention comprises a polishing platen, a roller pad assembly capable of advancing a polishing pad across the platen, a substrate carrier to press a substrate against the polishing pad, and a heater to heat the substrate to a temperature sufficiently high to provide a rate of removal of material from the substrate that compensates for the wear of the polishing pad. This patent showcases his expertise in improving manufacturing processes.

Career Highlights

Marks is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Some of his notable coworkers include Christopher Heung-Gyun Lee and Garlen C Leung. Their collaboration has likely fostered an environment of innovation and creativity within their projects.

Conclusion

Robert A Marks exemplifies the spirit of innovation through his patent and contributions to the field of chemical mechanical polishing. His work continues to influence the industry and drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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