Jiaqi Yang

Title: **The Innovative Mind of Jiaqi Yang: A Journey in Semiconductor Technology**

Introduction

Jiaqi Yang, based in Shanghai, China, is a prominent inventor with a strong focus on semiconductor technology. With a remarkable portfolio of seven patents, Yang has demonstrated profound expertise in improving the reliability and efficiency of CMOS devices. His innovative contributions have significantly impacted the field of electronics, showcasing his dedication to advancing technology and improving device performance.

Latest Patents

Two of Jiaqi Yang's latest patents highlight his inventive prowess. The first, titled "Structure for improving dielectric reliability of CMOS device," describes a semiconductor device that utilizes a semiconductor substrate and an interlayer dielectric layer. It features trenches for PMOS and NMOS devices, incorporating a high-k dielectric layer and work function adjustment layers for both types of devices. This design enhances the dielectric reliability crucial for modern electronics.

The second patent, "Semiconductor device having multiple work functions and manufacturing method thereof," outlines a method for manufacturing a semiconductor device. The process involves creating a substrate structure with multiple trenches and employing oxidation treatments to form oxide layers with varying oxygen content on work function adjustment layers. This innovative approach allows for improved performance in NMOS devices, setting a new standard in semiconductor manufacturing.

Career Highlights

Jiaqi Yang has built a notable career in leading semiconductor companies, including Semiconductor Manufacturing International Corporation (Shanghai) and Semiconductor Manufacturing International Corporation (Beijing). His work in these organizations has been pivotal in steering advances in semiconductor technology, further establishing him as a key figure in the industry.

Collaborations

Throughout his career, Yang has collaborated with several esteemed professionals, including Cheng-Tai Huang and Chen-Yi Huang. These partnerships illustrate his commitment to teamwork and knowledge sharing, enriching the collective expertise in semiconductor innovation.

Conclusion

Jiaqi Yang's contributions to semiconductor technology through his innovative patents and collaborative efforts mark him as a significant influencer in the field. His dedication to enhancing device reliability and performance inspires upcoming inventors and paves the way for future advancements in technology. With a robust foundation of patented inventions, Yang's impact on the industry will undoubtedly be felt for years to come.