Jiaozeng Zheng

Title: Innovations of Jiaozeng Zheng

Introduction

Jiaozeng Zheng is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics, holding a total of 3 patents. His work focuses on advanced technologies that enhance the efficiency and precision of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is the "Edge Exposure Device and Method." This invention includes an edge exposure apparatus designed to perform edge exposure processes on wafers. The apparatus features a base frame, an edge exposure unit, a pre-alignment unit for centering and orienting the wafer, a cassette unit for storing and detecting the wafer, a robotic arm for transferring the wafer, and a master control unit for managing these components. The design allows for structural compactness by having the edge exposure unit and pre-alignment unit share a common worktable. Additionally, he has developed a "Substrate Pre-Alignment Method," which involves a series of steps to accurately align a substrate with a substrate carrier stage using a set of marks arranged on its surface.

Career Highlights

Jiaozeng Zheng has worked with notable companies in the microelectronics sector, including Shanghai Micro Electronics Equipment (Group) Co., Ltd. and Shanghai Micro Electronics Equipment Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative solutions for semiconductor manufacturing.

Collaborations

Throughout his career, Jiaozeng has collaborated with talented individuals such as Gang Wang and Yunbin Pu. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.

Conclusion

Jiaozeng Zheng's contributions to the field of microelectronics through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations.