The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Jun. 30, 2017
Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;
Jinguo Yang, Shanghai, CN;
Wenli Tang, Shanghai, CN;
Gang Wang, Shanghai, CN;
Xinke Lang, Shanghai, CN;
Jiaozeng Zheng, Shanghai, CN;
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD., Shanghai, CN;
Abstract
An edge exposure apparatus and method are disclosed. The edge exposure apparatus includes: a base frame (); an edge exposure unit () mounted on the base frame and configured to perform an edge exposure process on a wafer; a pre-alignment unit () for centering and orienting the wafer and cooperating with the edge exposure unit () in the edge exposure process; a cassette unit () for storing and detecting the wafer; a robotic arm () for transferring the wafer; and a master control unit () for controlling the above components of the edge exposure apparatus. The edge exposure unit () and the pre-alignment unit () share a common worktable, resulting in structural compactness. Alternatively, two pre-alignment units () and two edge exposure units () may be included in order to increase processing efficiency.