Xinke Lang

Title: Xinke Lang: Innovator in Edge Exposure Technology

Introduction

Xinke Lang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and technologies. His work focuses on enhancing the efficiency and effectiveness of edge exposure processes in wafer production.

Latest Patents

Xinke Lang holds a patent for an edge exposure device and method. This patent describes an edge exposure apparatus that includes a base frame, an edge exposure unit mounted on the base frame, and a pre-alignment unit for centering and orienting the wafer. The apparatus is designed to perform an edge exposure process on a wafer, with a cassette unit for storing and detecting the wafer, a robotic arm for transferring the wafer, and a master control unit for managing the components. The design allows for structural compactness by having the edge exposure unit and the pre-alignment unit share a common worktable. Additionally, the apparatus can be configured with two pre-alignment units and two edge exposure units to increase processing efficiency. Xinke Lang has 1 patent to his name.

Career Highlights

Xinke Lang is associated with Shanghai Micro Electronics Equipment (Group) Co., Ltd., where he has played a crucial role in developing advanced semiconductor manufacturing equipment. His expertise in edge exposure technology has positioned him as a key figure in the industry.

Collaborations

Xinke Lang has collaborated with notable colleagues, including Jinguo Yang and Wenli Tang. Their combined efforts have contributed to the advancement of technologies in the semiconductor field.

Conclusion

Xinke Lang's innovative work in edge exposure technology has made a significant impact on the semiconductor manufacturing industry. His contributions continue to drive advancements in efficiency and effectiveness in wafer production.