Wenli Tang

Title: Innovator Profile: Wenli Tang

Introduction

Wenli Tang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics through his innovative designs and patents. His work focuses on enhancing the efficiency and effectiveness of edge exposure processes in semiconductor manufacturing.

Latest Patents

Wenli Tang holds a patent for an "Edge exposure device and method." This invention includes an edge exposure apparatus that features a base frame, an edge exposure unit mounted on the base frame, and a pre-alignment unit for centering and orienting the wafer. The apparatus is designed to perform an edge exposure process on a wafer, with a cassette unit for storing and detecting the wafer, a robotic arm for transferring the wafer, and a master control unit for managing the components. The design allows for structural compactness by having the edge exposure unit and the pre-alignment unit share a common worktable. Additionally, the apparatus can be configured with two pre-alignment units and two edge exposure units to enhance processing efficiency. Wenli Tang has 1 patent to his name.

Career Highlights

Wenli Tang is currently employed at Shanghai Micro Electronics Equipment (Group) Co., Ltd. His role involves developing advanced technologies that contribute to the semiconductor industry. His innovative approach has positioned him as a key player in the field.

Collaborations

Wenli Tang has collaborated with notable colleagues, including Jinguo Yang and Gang Wang. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Wenli Tang's contributions to the field of microelectronics through his patent and work at Shanghai Micro Electronics Equipment (Group) Co., Ltd. highlight his innovative spirit and dedication to advancing technology. His inventions play a crucial role in improving semiconductor manufacturing processes.