Jianqiu Guo

Title: Innovations of Jianqiu Guo

Introduction

Jianqiu Guo is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of materials science and engineering. With a total of 5 patents to his name, Guo has made remarkable advancements in the development of metal nitride technologies.

Latest Patents

Guo's latest patents include a method of tuning film properties of metal nitride using plasma. This innovative method involves forming a metal nitride layer on a substrate by exposing it to a first deposition gas mixture, followed by a series of purging and deposition steps to ensure optimal film quality. Another notable patent is the seamless gapfill of metal nitrides, which describes methods for filling substrate features with a seamless metal gate fill. This process includes sequentially depositing a film on a substrate surface and treating it with an oxidizing plasma to achieve a high-quality fill without seams or voids.

Career Highlights

Jianqiu Guo is currently employed at Applied Materials, Inc., a leading company in the semiconductor and materials engineering industry. His work at Applied Materials has positioned him as a key player in advancing technologies that are critical for modern electronics.

Collaborations

Throughout his career, Guo has collaborated with notable colleagues such as Srinivas Gandikota and Yixiong Yang. These collaborations have further enhanced his research and development efforts in the field.

Conclusion

Jianqiu Guo's innovative work and patents in metal nitride technologies reflect his expertise and commitment to advancing materials science. His contributions continue to impact the semiconductor industry significantly.