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For the Inventor, By the Inventor

San Jose, CA, United States of America

Jian Ding

This inventor holds 25 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Plasma Etching Technology. Top assignees: Applied Materials, Inc., Alta Devices, Inc., Other. Active years: 1996-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jian Ding. Retrieved from https://idiyas.com/inventor/jian-ding-hisxwdpe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 80.0


Average Co-Inventor Count = 3.3

ph-index = 16

Forward Citations = 1,110(Granted Patents)


Company Filing History:

goldMedal21 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal1 out of 84 
 
Alta Devices, Inc.
 patents
bronzeMedal3 out of 834,570 
Other
 patents

Years Active: 1996-2020

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Areas of Expertise:
Plasma Etching
Semiconductor Fabrication
Photomask Processes
Critical Dimension Control
Adaptive RAID Operation
Oxide Etching
High-Density Plasma
Integrated Metrology
Dielectric Materials
Self-Aligned Contact
Reticle Fabrication
Data Exchange
25 patents (USPTO):Explore Patents
1. 10693027 - Method for interconnecting solar cells (2020-06-23),
2. 8202441 - Process for etching a metal layer suitable for use in photomask fabrication (2012-06-19),
3. 7774542 - System and method for adaptive operation of storage capacities of RAID systems (2010-08-10),
4. 7737040 - Method of reducing critical dimension bias during fabrication of a semiconductor device (2010-06-15),
5. 7682518 - Process for etching a metal layer suitable for use in photomask fabrication (2010-03-23),
6. 7640381 - Input/output decoupling system method having a cache for exchanging data between non-volatile storage and plurality of clients having asynchronous transfers (2009-12-29),
7. 7521000 - Process for etching photomasks (2009-04-21),
8. 7365014 - Reticle fabrication using a removable hard mask (2008-04-29),
9. 7250309 - Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control (2007-07-31),
10. 6818140 - Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material (2004-11-16),
11. 6399511 - Plasma etch process in a single inter-level dielectric etch (2002-06-04),
12. 6380096 - In-situ integrated oxide etch process particularly useful for copper dual damascene (2002-04-30),
13. 6361705 - Plasma process for selectively etching oxide using fluoropropane or fluoropropylene (2002-03-26),
14. 6329292 - Integrated self aligned contact etch (2001-12-11),
15. 6284149 - High-density plasma etching of carbon-based low-k materials in a integrated circuit (2001-09-04),

Title: Innovations and Patents of Jian Ding in San Jose, CA

Introduction

Jian Ding, a prolific inventor based in San Jose, California, has a remarkable portfolio comprising 25 patents. His innovative contributions to the field of photovoltaic technology and photomask fabrication demonstrate a commitment to advancing renewable energy and manufacturing processes.

Latest Patents

Among Jian Ding's latest patents is a method for interconnecting solar cells, which details a photovoltaic module that integrates a back substrate with a series of conductive interconnects on its surface. This innovative approach enables efficient electrical contact between multiple photovoltaic cells, facilitating optimal energy production. Another notable patent is a process for etching a metal layer suitable for use in photomask fabrication. This method involves the use of a specialized processing gas to etch exposed portions of a metal layer on a substrate, enhancing precision in photolithographic applications.

Career Highlights

Throughout his career, Jian Ding has made significant contributions while working at renowned companies, notably Applied Materials, Inc. His experience at such leading companies underscores his expertise in the technological advancements related to solar energy and photomask technologies. His work has consistently pushed the boundaries of what's possible within these fields.

Collaborations

Jian Ding has collaborated with esteemed colleagues such as Yung-Hee Yvette Lee and Gerald Z Yin. These partnerships reflect a strong commitment to teamwork and the sharing of innovative ideas, all contributing to their collective success in developing cutting-edge technologies.

Conclusion

With an impressive array of 25 patents, Jian Ding stands out as a prominent figure in the realms of photovoltaics and photomask technology. His innovative methodologies and collaboration with industry experts position him as a crucial contributor to future advancements, paving the way for sustainable energy solutions and enhanced manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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