Ji Cui

Title: Ji Cui: Innovator in Chemical-Mechanical Polishing Technology

Introduction

Ji Cui, based in Aurora, Illinois, is a notable inventor with a remarkable portfolio consisting of 21 patents. His groundbreaking work primarily focuses on advancements in the field of chemical-mechanical polishing compositions, which are essential for various industrial applications, particularly in semiconductor manufacturing.

Latest Patents

One of Ji Cui's latest inventions is a method designed to increase barrier film removal rates in bulk tungsten slurry. This innovative chemical-mechanical polishing composition includes a first abrasive made of cationically modified colloidal silica particles, a second abrasive with a Mohs hardness of about 5.5 or more, and additional components such as a cationic polymer, an iron-containing activator, an oxidizing agent, and water. This invention offers a comprehensive approach to polishing substrates, especially those made from tungsten and barrier layers like nitrides.

Another significant patent developed by Ji Cui is for surface-treated abrasive particles intended for tungsten buff applications. This invention features a chemical-mechanical polishing composition comprising abrasives such as alumina, ceria, titania, and zirconia, which are coated with a copolymer that combines sulfonic and carboxylic acid monomeric units, as well as phosphonic acid units. The composition has a pH range of about 2 to about 5, allowing effective polishing of substrates, with particular emphasis on tungsten or cobalt and silicon oxide components.

Career Highlights

Ji Cui has contributed extensively to the field through his roles in various reputable companies. Notably, he has worked at Nalco Company and Cabot Microelectronics Corporation, where he was involved in research and development of innovative products that push the boundaries of chemical-mechanical polishing technology.

Collaborations

Throughout his career, Ji Cui has had the privilege of collaborating with talented colleagues such as Viet Lam and Timothy La. Their collaborative efforts have been instrumental in the successful development of numerous patented technologies that enhance the performance of chemical-mechanical polishing systems.

Conclusion

Ji Cui stands out as an influential inventor in the field of chemical-mechanical polishing. With his impressive roster of 21 patents and continuous innovation, he contributes significantly to advancements in polishing technology, benefiting numerous industries, including semiconductor manufacturing. His work exemplifies the impact that dedicated inventors can have on both technological progress and practical applications.