Hsinchu, Taiwan

Jet-Rung Chang

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2018-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jet-Rung Chang. Retrieved from https://idiyas.com/inventor/jet-rung-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 1


Company Filing History:


Years Active: 2018-2023

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2 patents (USPTO):Explore Patents

Title: Jet-Rung Chang: Innovator in Semiconductor Technology

Introduction

Jet-Rung Chang is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device formation and measurement methods.

Latest Patents

One of Jet-Rung Chang's latest patents is a formation method of a semiconductor device with a gate all around structure. This method involves creating an n-type doped region in a semiconductor substrate and forming a semiconductor stack over it. The stack consists of multiple sacrificial and semiconductor layers arranged alternately. The process includes introducing n-type dopants from the doped region into the stack, patterning it to create a fin structure, and forming a dummy gate stack around part of the fin. The dummy gate stack and sacrificial layers are then removed to release semiconductor nanostructures, followed by the formation of a metal gate stack around these structures.

Another notable patent is a metrology system and measurement method that focuses on thickness measurement. This method entails forming an implantation region in a semiconductor substrate and generating modulated free carriers within it. A probe beam is directed onto the semiconductor layer and the implantation region, with the reflected beam being detected to determine the thickness of the semiconductor layer.

Career Highlights

Jet-Rung Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has significantly impacted the development of advanced semiconductor devices, enhancing their performance and efficiency.

Collaborations

Throughout his career, Jet-Rung Chang has collaborated with notable colleagues, including Te-An Yu and Hung-Ju Chou. These partnerships have fostered innovation and contributed to the advancement of semiconductor technologies.

Conclusion

Jet-Rung Chang's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the field. His advancements continue to shape the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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