Jes Asmussen

Title: Innovations of Jes Asmussen: A Pioneer in Microwave Plasma Technology

Introduction

Jes Asmussen, based in East Lansing, MI, is an accomplished inventor with an impressive portfolio of 35 patents to his name. His contributions to the field of microwave plasma technology, particularly in chemical vapor deposition (CVD) processes, have been significant. Asmussen's work primarily focuses on enhancing the efficiency and control of materials such as diamond, paving the way for innovative applications in various industries.

Latest Patents

Among Jes Asmussen's latest innovations are two patents that deal with methods and apparatus for microwave plasma assisted chemical vapor deposition reactors. The first patent describes a microwave cavity plasma reactor (MCPR) apparatus designed to enable microwave plasma assisted chemical vapor deposition (MPACVD) while allowing for the measurement of the local surface properties of the component being grown. This technology incorporates optically transparent conductive regions in the microwave chamber, facilitating external optical measurements during the deposition process.

The second patent emphasizes the tuning and process control methods that are crucial for efficient MPACVD. This apparatus enables precise control over the microwave discharge position, size, and shape. Additionally, it establishes efficient microwave power matching both before and during component deposition. Through real-time process control, the device can adapt to various conditions, maintaining the reactor's performance throughout the deposition process.

Career Highlights

Jes Asmussen has worked with prestigious institutions, including Michigan State University and Fraunhofer USA, Inc., where he has applied his expertise to further advancements in the field of plasma technology. His academic and practical contributions have made him a notable figure in the innovation landscape, especially concerning advanced deposition techniques.

Collaborations

Throughout his career, Asmussen has collaborated with esteemed colleagues such as Donnie K. Reinhard and Timothy Grotjohn. These partnerships have undoubtedly enriched his research and development efforts, leading to groundbreaking advancements in microwave plasma methodologies and applications.

Conclusion

With 35 patents to his name, Jes Asmussen represents a remarkable force in the realm of microwave plasma technology and chemical vapor deposition. His latest innovations not only exhibit his technical prowess but also underscore the transformative potential of his inventions in various industries. Asmussen's contributions will likely continue to influence researchers and engineers alike, encouraging further advancements within this dynamic field.