The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2007
Filed:
Jun. 14, 2006
Jes Asmussen, East Lansing, MI (US);
Timothy Grotjohn, Okemos, MI (US);
Ning Xi, Okemos, MI (US);
Timothy P. Hogan, Grand Ledge, MI (US);
Jes Asmussen, East Lansing, MI (US);
Timothy Grotjohn, Okemos, MI (US);
Ning Xi, Okemos, MI (US);
Timothy P. Hogan, Grand Ledge, MI (US);
Board of Trustees of Michigan State University, East Lansing, MI (US);
Abstract
An apparatus and process for manufacturing changes of a substrate in a work region which is 100×100×100 microns or smaller is described. The apparatus uses a plasma source adjacent to the work region to produce radiation or matter which changes the surface. An atomic force microscope or laser can be used in addition. The process and apparatus can be used to produce MEMS devices on a substrate for use in a wide variety of applications.