Jeonghoon Ahn

Title: **Innovator Spotlight: Jeonghoon Ahn**

Introduction

Jeonghoon Ahn, an accomplished inventor based in Suwon-si, South Korea, has made significant contributions to the field of semiconductor technology. With a portfolio of six patents, his work focuses on improving the efficiency and design of semiconductor devices.

Latest Patents

Ahn's latest inventions include a groundbreaking metal-insulator-metal capacitor. This capacitor features a first electrode situated in a designated region on the upper surface of a substrate, a second electrode that envelops the first electrode, and a third electrode that further extends to encompass the second electrode. Two dielectric layers are strategically placed between these electrodes, enhancing the capacitor's performance and reliability.

Another notable patent involves a method for designing an interconnect structure of semiconductor apparatus. This method outlines a systematic approach to developing interconnection layers on a semiconductor substrate. Each interconnection layer comprises both dummy and main metal patterns, aiming to optimize the layout and functionality of semiconductor devices.

Career Highlights

Jeonghoon Ahn is currently employed at Samsung Electronics Co., Ltd., a global leader in technology and electronics. His work at Samsung has positioned him at the forefront of semiconductor research and development, contributing to advancements that resonate throughout the industry.

Collaborations

Throughout his career, Ahn has collaborated with fellow inventors, including Shaofeng Ding and Yunki Choi. These partnerships illustrate the teamwork and shared expertise that often drive innovation in complex fields like semiconductor technology.

Conclusion

With his vision and technological prowess, Jeonghoon Ahn continues to make impactful strides in the world of semiconductor innovations. His patents not only advance technology but also pave the way for future developments in this dynamic field.