Jeong Sik Oh

Title: Jeong Sik Oh: Innovator in Semiconductor Etching Technologies

Introduction

Jeong Sik Oh is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in etching compositions and methods. With a total of four patents to his name, his work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, Jeong Sik Oh has developed an etchant composition for silicon layers. This innovative composition includes a fluoride-based compound, a nitrate-based compound, an acid mixture comprising a phosphoric acid-based inorganic acid and an organic acid, and a nitrosyl compound. This formulation is capable of selectively etching the silicon layer while preserving the integrity of the silicon oxide layer. Another notable patent is for an etchant composition for semiconductor substrates. This composition is designed to selectively etch high-concentration doped layers of extrinsic semiconductors. It allows for uniform and stable etching while suppressing bubble formation during the etching process.

Career Highlights

Jeong Sik Oh is currently associated with Enf Technology Co., Ltd., where he continues to innovate in the semiconductor field. His work has been instrumental in enhancing the manufacturing processes of semiconductor devices, contributing to advancements in technology.

Collaborations

Jeong Sik Oh collaborates with notable colleagues such as Myung Ho Lee and Gi Young Kim. Their combined expertise fosters a productive environment for innovation and development in semiconductor technologies.

Conclusion

Jeong Sik Oh's contributions to semiconductor etching technologies highlight his role as a key inventor in the field. His innovative patents and collaborations continue to shape the future of semiconductor manufacturing.