The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Sep. 06, 2022
Applicants:
Enf Technology Co., Ltd., Gyeonggi-do, KR;
SK Hynix Inc., Gyeonggi-do, KR;
Inventors:
Jeong Sik Oh, Gyeonggi-do, KR;
Tae Ho Kim, Gyeonggi-do, KR;
Gi Young Kim, Gyeonggi-do, KR;
Myung Ho Lee, Gyeonggi-do, KR;
Myung Geun Song, Gyeonggi-do, KR;
Pilgu Kang, Gyeonggi-do, KR;
Youngmee Kang, Gyeonggi-do, KR;
Eunseok Oh, Gyeonggi-do, KR;
Assignees:
ENF TECHNOLOGY CO., LTD., Gyeonggi-do, KR;
SK hynix Inc., Gyeonggi-do, KR;
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); H10P 50/64 (2026.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); H10P 50/642 (2026.01);
Abstract
Silicon etching compositions are described and may be used for selectively etching silicon with respect to a metal film. In particular, the silicon etching compositions can be used to improve the selective etching ratio of silicon from the surface of a semiconductor on which the metal film and silicon are exposed.