The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2024
Filed:
May. 05, 2022
Applicant:
Enf Technology Co., Ltd., Gyeonggi-do, KR;
Inventors:
Tae Ho Kim, Gyeonggi-do, KR;
Jeong Sik Oh, Gyeonggi-do, KR;
Gi Young Kim, Gyeonggi-do, KR;
Myung Ho Lee, Gyeonggi-do, KR;
Myung Geun Song, Gyeonggi-do, KR;
Assignee:
ENF TECHNOLOGY CO., LTD., Gyeonggi-do, KR;
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); C01B 33/20 (2006.01); C07F 7/08 (2006.01); H01L 21/4757 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); C01B 33/20 (2013.01); C07F 7/0805 (2013.01); H01L 21/47573 (2013.01);
Abstract
Silicon etching compositions are described and may be used for selectively etching silicon with respect to a silicon insulating film. In particular, the silicon etching compositions can be used to improve the selective etching ratio of silicon from the surface of a semiconductor on which a silicone oxide film and silicon are exposed.