The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
Dec. 20, 2022
Applicant:
Enf Technology Co., Ltd., Yongin-si, KR;
Inventors:
Jeong Sik Oh, Yongin-si, KR;
Hak Soo Kim, Yongin-si, KR;
Gi Young Kim, Yongin-si, KR;
Myung Ho Lee, Yongin-si, KR;
Myung Geun Song, Yongin-si, KR;
Assignee:
ENF TECHNOLOGY CO., LTD., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); H01L 21/30604 (2013.01);
Abstract
Provided is an etchant composition for a silicon layer including: a fluoride-based compound; a nitrate-based compound; an acid mixture including a phosphoric acid-based inorganic acid and an organic acid; and a nitrosyl compound and capable of selectively etching the silicon layer with respect to a silicon oxide layer.