This inventor holds 3 USPTO granted patents. Top assignees: Samsung Sdi Co., Inc., Cheil Industries Inc.. Active years: 2017-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017-2020
Title: Jeong Hwan Jeong: Innovator in CMP Slurry Composition
Introduction
Jeong Hwan Jeong is a notable inventor based in Uiwang, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a focus on slurry compositions for copper line polishing. With a total of 3 patents, his work has advanced the efficiency and effectiveness of polishing methods in semiconductor manufacturing.
Latest Patents
Jeong's latest patents include innovative CMP slurry compositions designed for polishing copper lines. The first patent details a CMP slurry composition that comprises colloidal silica, an oxidizing agent, a complexing agent, a corrosion inhibitor, a pH regulator, and ultrapure water. This composition is characterized by a specific surface area (BET) of 72.9 to 88.5 m/g, with 0.1 to 2 wt % of colloidal silica included. The slurry demonstrates an excellent copper line polishing rate, minimizes defects and scratches, and reduces dishing during the polishing process. The second patent focuses on a CMP slurry composition that includes polishing particles and deionized water, where both inorganic and organic particles possess a positive zeta potential. This innovation also encompasses a polishing method for copper wire using the described CMP slurry composition.
Career Highlights
Throughout his career, Jeong Hwan Jeong has worked with prominent companies in the industry, including Samsung SDI Co., Inc. and Cheil Industries Inc. His experience in these organizations has contributed to his expertise in developing advanced polishing solutions.
Collaborations
Jeong has collaborated with notable colleagues such as Jong Il Noh and Dong Hun Kang, further enhancing his contributions to the field of CMP technology.
Conclusion
Jeong Hwan Jeong's innovative work in CMP slurry compositions has significantly impacted the semiconductor industry. His patents reflect a commitment to improving polishing methods, showcasing his expertise and dedication to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile