Jeffery Burton Maxson

Title: The Innovative Contributions of Jeffery Burton Maxson

Introduction

Jeffery Burton Maxson is a prominent inventor based in New Windsor, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His work focuses on improving the fabrication processes of integrated circuits, which are essential components in modern electronics.

Latest Patents

Maxson's latest patents include innovative methods for controlling wafer curvature during the fabrication of integrated circuits. These methods involve controlling the conductor density of wiring levels, adding compensating stressed film layers, and disturbing the continuity of stress films with the immediately lower layer. Additionally, he has developed a structure and method for creating entirely self-aligned metallic contacts. This semiconductor structure features field effect transistors on a semiconductor substrate, with a gate conductor stack that includes a lower layer of polysilicon and an upper layer of a first metal semiconductor alloy.

Career Highlights

Maxson is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the performance and reliability of integrated circuits, which are vital for various electronic applications.

Collaborations

Throughout his career, Maxson has collaborated with notable colleagues, including Mohammed Fazil Fayaz and Anthony K Stamper. These collaborations have fostered a creative environment that has led to groundbreaking advancements in semiconductor technology.

Conclusion

Jeffery Burton Maxson's contributions to the field of semiconductor technology are noteworthy and impactful. His innovative patents and collaborative efforts at IBM continue to shape the future of integrated circuits.