Incheon, South Korea

Jee Young Lee

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Seoul, KR (2018)
  • Incheon, KR (2022 - 2024)

Company Filing History:


Years Active: 2018-2025

Loading Chart...
7 patents (USPTO):Explore Patents

Title: Innovations of Jee Young Lee

Introduction

Jee Young Lee is a prominent inventor based in Incheon, South Korea. With a total of seven patents to his name, he has made significant contributions to the field of substrate treatment technology. His innovative approaches have garnered attention in various industries.

Latest Patents

One of Jee Young Lee's latest patents is a substrate treating apparatus that includes a support unit for holding a substrate and a laser unit that irradiates a laser beam onto the substrate. This apparatus features an irradiation member that emits the laser beam, a rotatable lens positioned along the beam's travel path, and a reflection member with an inclined surface to alter the beam's trajectory after passing through the lens. Another notable patent is also a substrate treating apparatus, which incorporates a support unit and a heating unit that emits a beam to heat the substrate. This heating unit consists of an irradiation part for beam emission and a rotation part for beam rotation.

Career Highlights

Jee Young Lee has worked with Semes Co., Ltd., where he has applied his expertise in developing advanced substrate treatment technologies. His work has been instrumental in enhancing the efficiency and effectiveness of substrate processing.

Collaborations

Throughout his career, Jee Young Lee has collaborated with notable colleagues, including Tae Shin Kim and Young Dae Chung. These partnerships have contributed to the successful development of innovative technologies in their field.

Conclusion

Jee Young Lee's contributions to substrate treatment technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative solutions continue to influence advancements in substrate processing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…