The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Oct. 17, 2020
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Young Dae Chung, Incheon, KR;
Won Geun Kim, Goyang-si, KR;
Jee Young Lee, Incheon, KR;
Ji Hoon Jeong, Hwaseong-si, KR;
Tae Shin Kim, Suwon-si, KR;
Se Hoon Oh, Cheonan-si, KR;
Pil Kyun Heo, Hwaseong-si, KR;
Hyun Goo Park, Cheonan-si, KR;
Assignee:
SEMES CO., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/306 (2006.01); C09K 13/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); H01L 21/30604 (2013.01); H01L 21/67115 (2013.01); C09K 13/04 (2013.01);
Abstract
Disclosed is a substrate treatment apparatus including a rotation unit that supports and rotates a substrate, a chemical discharge unit that discharges a chemical solution to the rotation unit, a chemical recovery unit disposed close to the rotation unit and configured to recover the chemical solution scattering from the rotation unit, and a laser irradiation unit that applies a laser beam to the substrate and heats the substrate.