Company Filing History:

5 out of 164,108

International Business Machines Corporation

patents

3 out of 7

Freudenberg Nonwovens

patents

2 out of 9

Freudenberg Nonwovens Limited Partnership

where one patent can have more than one assignee

Years Active: 2002-2009

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10 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 7534163 - Polishing pad (2009-05-19),

2. 7357704 - Polishing pad (2008-04-15),

3. 7186166 - Fiber embedded polishing pad (2007-03-06),

4. 7086932 - Polishing pad (2006-08-08),

5. 6989117 - Polishing pads with polymer filled fibrous web, and methods for fabricating and using same (2006-01-24),

6. 6964604 - Fiber embedded polishing pad (2005-11-15),

7. 6890244 - Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles (2005-05-10),

8. 6712681 - Polishing pads with polymer filled fibrous web, and methods for fabricating and using same (2004-03-30),

9. 6656018 - Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles (2003-12-02),

10. 6383066 - Multilayered polishing pad, method for fabricating, and use thereof (2002-05-07),

Title: The Innovations of Jean Vangsness

Introduction

Jean Vangsness is a notable inventor based in Stow, MA (US), recognized for his contributions to the field of semiconductor polishing technology. With a total of 10 patents to his name, Vangsness has made significant advancements that enhance the efficiency and effectiveness of polishing pads used in various applications.

Latest Patents

Among his latest innovations is an improved polishing pad designed for polishing semiconductors and other planar substrates. This polishing pad is notable for its ability to function effectively in the presence of a slurry that may contain abrasive particles. The design incorporates a non-woven fibrous component, which may include bicomponent fibers, all embedded within a polymer matrix component. This innovative approach aims to optimize the polishing process, ensuring better results in semiconductor manufacturing.

Career Highlights

Throughout his career, Jean Vangsness has worked with prominent companies, including International Business Machines Corporation (IBM) and Freudenberg Nonwovens. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in the industry.

Collaborations

Some of his notable coworkers include Oscar Kai Chi Hsu and Shyng-Tsong Chen, who have collaborated with Vangsness on various projects, further enhancing the innovation landscape in their field.

Conclusion

Jean Vangsness stands out as a significant figure in the realm of semiconductor polishing technology. His innovative patents and collaborations reflect his commitment to advancing the industry and improving manufacturing processes.

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1 patent (EPO):

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