The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2004
Filed:
Nov. 20, 2000
Shyng-Tsong Chen, Patterson, NY (US);
Kenneth P. Rodbell, Sandy Hook, CT (US);
Oscar Kai Chi Hsu, Chelmsford, MA (US);
Jean Vangsness, Stow, MA (US);
David S. Gilbride, Lowell, MA (US);
Scott Clayton Billings, Kingston, NH (US);
Kenneth Davis, Newburgh, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A polishing pad having a body comprising fibers embedded in a matrix polymer formed by a reaction of polymer precursors. The fibers define interstices, and the precursors fill these interstices substantially completely before completion of the reaction. The pad may include a thin layer of free fibers at its polishing surface. A segment of at least a portion of the free fibers are embedded in the adjacent body of the polymer and fibers. The fibers may be separate, or in the form of a woven or non-woven web.