Company Filing History:

6 out of 164,108

International Business Machines Corporation

patents

3 out of 7

Freudenberg Nonwovens

where one patent can have more than one assignee

Years Active: 2002-2009

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9 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 7534163 - Polishing pad (2009-05-19),

2. 7357704 - Polishing pad (2008-04-15),

3. 7186166 - Fiber embedded polishing pad (2007-03-06),

4. 7086932 - Polishing pad (2006-08-08),

5. 6989117 - Polishing pads with polymer filled fibrous web, and methods for fabricating and using same (2006-01-24),

6. 6964604 - Fiber embedded polishing pad (2005-11-15),

7. 6712681 - Polishing pads with polymer filled fibrous web, and methods for fabricating and using same (2004-03-30),

8. 6383066 - Multilayered polishing pad, method for fabricating, and use thereof (2002-05-07),

9. 6340325 - Polishing pad grooving method and apparatus (2002-01-22),

Title: The Innovative Contributions of Oscar Kai Chi Hsu

Introduction

Oscar Kai Chi Hsu is a notable inventor based in Chelmsford, MA, with a remarkable portfolio of nine patents. His work primarily focuses on advancements in polishing pads used in the semiconductor industry, showcasing his commitment to innovation and technology.

Latest Patents

One of Hsu's latest patents involves an improved polishing pad designed for polishing semiconductors and other planar substrates. This innovative polishing pad is engineered to function effectively in the presence of a slurry that may contain abrasive particles. The pad comprises a non-woven fibrous component, which may include bicomponent fibers, all embedded within a polymer matrix component. This design enhances the efficiency and effectiveness of the polishing process.

Career Highlights

Throughout his career, Oscar Hsu has made significant contributions to the field of materials science and engineering. He has worked with prominent companies, including International Business Machines Corporation (IBM) and Freudenberg Nonwovens. His experience in these organizations has allowed him to develop and refine his innovative ideas, leading to the successful patenting of his inventions.

Collaborations

Hsu has collaborated with several talented individuals in his field, including Jean Vangsness and Shyng-Tsong Chen. These collaborations have fostered a creative environment that has contributed to the development of his patented technologies.

Conclusion

Oscar Kai Chi Hsu's contributions to the field of semiconductor polishing technology are noteworthy. His innovative patents and collaborations reflect his dedication to advancing the industry. His work continues to influence the development of more efficient and effective polishing solutions.

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