The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2005

Filed:

Apr. 05, 2004
Applicants:

Shyng-tsong Chen, Patterson, NY (US);

Kenneth Davis, Newburgh, NY (US);

Oscar Kai Chi Hsu, Chelmsford, MA (US);

Kenneth Rodbell, Sandy Hook, CT (US);

Jean Vangsness, Stow, MA (US);

Inventors:

Shyng-Tsong Chen, Patterson, NY (US);

Kenneth Davis, Newburgh, NY (US);

Oscar Kai Chi Hsu, Chelmsford, MA (US);

Kenneth Rodbell, Sandy Hook, CT (US);

Jean Vangsness, Stow, MA (US);

Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24D011/00 ;
U.S. Cl.
CPC ...
Abstract

A polishing pad having a body comprising fibers embedded in a matrix polymer formed by a reaction of polymer precursors. The loose fibers define and the precursors were mixed first with curatives, then mold into a pad form. The pad may include a thin layer of free fibers at its polishing surface. A segment of at least a portion of the free fibers are embedded in the adjacent body of the polymer and fibers.


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