The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Jun. 15, 2006
Applicants:
Jean Vangsness, Stow, MA (US);
Oscar Kai Chi Hsu, Chelmsford, MA (US);
Alaka Potnis, Hudson, NH (US);
Inventors:
Jean Vangsness, Stow, MA (US);
Oscar Kai Chi Hsu, Chelmsford, MA (US);
Alaka Potnis, Hudson, NH (US);
Assignee:
innoPad, Inc., Peabody, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An improved polishing pad for polishing semi-conductors and other planar substrates in the presence of a slurry which optionally may contain abrasive particles is disclosed. The polishing pad comprises a non-woven fibrous component, a portion which may optionally comprise bicomponent fibers, optionally embedded within a polymer matrix component.